Influence of the negative R.F. bias voltage on the structural, mechanical and electrical properties of Hf–C–N coatings

Abstract

Abstract In this work Hf–C–N coatings were deposited on silicon substrates by reactive R.F. magnetron co-sputtering from two hafnium and carbon targets in a reactive nitrogen atmosphere at various negative bias voltages from 0 to 150 V. The effect of the bias voltage on the chemical composition, crystalline structure and mechanical properties was studied by X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), Raman spectroscopy, X-ray diffraction (XRD) and nanoindentation. The results show that the obtained films have a Hf /( C + N ) ratio of around 1 and present an evolution with the bias voltage from a quasi-amorphous structure, with a low hardness (6 GPa) to crystalline Hf 2 CN films with a high hardness (23 GPa) and electrical resistivity values in the order of 10 4 Ω·cm − 1 . This study shows the potential for hard and electrically conductive Hf–C–N films in industrial applications.