Abstract
AbstractThree series of Ti-N films with varying nitrogen contents from about 8 to 52 at.% N were deposited by triode ion plating at temperatures of 773, 623 and 373 K, respectively.Marked changes in the structures of the films with decreasing temperature were observed by x-ray diffraction.Stoichiometric δ-TiN which showed (220) preferred orientation at 773 K changed to (111) at lower temperatures.At intermediate nitrogen concentrations α-Ti (002) decreased and a new ε-Ti2N (002) developed with decreasing temperature.Very smooth and dense films could be produced at the lower temperatures.
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