Abstract
A Radio Frequency (RF) technique was used to prepare ZnO thin films with different substrate temperature under ultra high vacuum. Structure results revealed that these films have crystalline structure. The structure of these films was carried out using X-ray Diffraction and Atomic Force Electron Microscope (AFM). The grain size for these films were determined using AFM photos. The optical parameters such as, optical energy gap, refractive index, extinction coefficient, dielectric loss and dielectric tangent loss for these films were determined. Another important parameters such as dispersion energy, oscillating energy and the ratio between the free carrier concentration/effective mass (N/m*) were determined optically. It was found that, the substrate temperature for these investigated films plays an important rule for changing an optical and dielectric results of these films.
Published Version
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