Abstract
Titanium dioxide (TiO2) films have been prepared by DC reaction magnetron sputtering technique on different substrates (glass, SiO2, platinum electrode-Pt, Silicon-Si). X-ray diffraction (XRD) patterns showed that all TiO2 films were grown along the preferred orientation of (110) plane. Samples on Si and Pt substrates are almost monophasic rutile, however, samples on glass and SiO2 substrates accompanied by a weak anatase structure. Atomic force microscopy (AFM) images revealed uniform grain distribution except for films on Pt substrates. Photoluminescence (PL) spectra showed obvious intrinsic emission band, but films on glass was accompanied by a distinct defect luminescence region. Raman spectroscopy suggested that all samples moved to high wavenumbers and films on glass moved obviously.
Highlights
Titanium dioxide (TiO2) is an important oxide ceramics, and used as semiconductor material
Comparing with glass and SiO2 substrates, films deposited on Pt and Si substrates respectively tended to grow in a single phase, and films on Si substrate exhibited better prefer orientation, indicates substrates have a significant influence on the TiO2 phase structure.[16]
TiO2 films were deposited by reaction magnetron sputtering on different substrates (Si, glass, SiO2 and Pt)
Summary
Minimizes the roughness of the deposited layers.[11] magnetron sputtering is a good candidate for depositing TiO2 films. The glass, stainless steel, titanium and sapphire were traditionally used as substrates, while substrates of SiO2, Pt, Si were few reported.[12,13] In this paper, TiO2 films were deposited on glass, SiO2, Pt and Si substrates respectively by DC reaction magnetron sputtering. The structural, morphological and optical properties of the TiO2 films on different substrates were characterized
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