Abstract
An effect of substrate surface regular wavy microrelief on the Freedericksz transition in a thin homeotropically aligned nematic cell near the smectic-A-nematic second-order transition temperature is theoretically investigated. It is shown that because of the suppression of an interfacial smectic-A structure, the Fréedericksz critical field for the cell with substrates having a sufficiently sharp microrelief should be significantly lower than that for the cell of the same thickness, but with perfectly flat substrates.
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