Abstract
For the first time, the influence of fast pulse induced skin effect on the current distribution inside the grounded-gate NMOS (GGNMOS) is reported. The skin effect results in the current crowding at the finger edges of the GGNMOS, leading to the high photoemission and high substrate potential at those regions. This report comprehensively explains some of the decades-old unexplained physical phenomena.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Paper version not known
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
