Abstract

Zinc-nickel-SiO2 electrodeposits have been produced from an acid sulphate bath. Thecodeposition behavior of SiO2 and the homogeneity of platings were examined. The presence ofSiO2 nanoparticles in the plating bath appears to change the alloy deposition behavior. Rate ofnickel deposition was considerably decreased with SiO2 nanoparticles in the bath. The homogeneityof platings between zinc and nickel were improved by adding the SiO2 nanoparticles in the bath. Atan early stage of electrodeposition, it seems that the SiO2 nanoparticle acts as a nucleus of theprecipitation. The SiO2 nanoparticle has not uniformly dispersed in a plating film, but distributedonly in the SiO2 rich layer with about 50 nm in thickness formed beneath the surface. In addition,this SiO2 rich layer can improve the anticorrosive performance. Therefore, the zincic use can besuppressed, because film thickness can be more thinned, compared with zinc and zinc-nickel alloyelectroplating.

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