Abstract
The influence of gate metal with thermal annealed process adopt to control the distance between gate and channel on pseudomorphic Al0.24Ga0.76As/ In0.22Ga0.78As double heterojunction high electron mobility transistors (DH-HEMTs) were studied. Compared to device with gate-recess process, the distance of gate-to-channel could be controlled through the thermal annealed process and therefore exhibit a lower series resistance. Measured transconductance of 150 mS/mm and an open- drain voltage gain of 136 for the DH-HEMT with an as deposited gate are enhanced to 175 mS/mm and 160 for the DH-HEMT with a 330-{degree sign}C annealed gate. Good device linearity is also obtained with a low second-harmonic to fundamental ratio of 3.55 %. In addition, good microwave performances such as unit-current gain- and maximum power gain- frequency were also obtained from devices with gate-annealed process.
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