Influence of Process Parameters on the Aerosol Deposition (AD) of Yttria-Stabilized Zirconia Particles

Abstract

Aerosol deposition (AD) is a novel deposition process for the fabrication of dense and rather thick oxide films at room temperature. The bonding of the deposited ceramic particles is based on a shock-loading consolidation, resulting from the impact of the ceramic particles on the substrate. However, the deposition mechanism is not fully understood. In addition, many technical challenges have been observed for achieving a successful deposition of the oxides with higher efficiency. In this work, the influence of different processing parameters on the properties of the deposited layer is studied. Proof of concept was done using 8 mol.% yttria-stabilized zirconia (8YSZ) powder as starting material. The window of deposition with respect to carrier gas flows for successful deposition was identified. The influence of this carrier gas flow, the substrate materials and the carrier gas species on the coating thickness, interface quality and coating microstructure was systematically investigated. The derived mechanical characteristics revealed an unexpected behavior related to a gradient microstructure. This study supports understanding of the mechanism of room-temperature impact consolidation and its effect on the mechanical properties of the deposited layer.