Abstract
The influence of point defects on grain boundary diffusion of Co ions in NiO was studied using polycrystalline films and bicrystals. Grain boundary diffusion was studied at 750 C at oxygen partial pressure. Two diffusion regions were found. At low oxygen pressures, extrinsic diffusion was observed. Above oxygen pressure of 10{sup {minus}7}, influence of intrinsic point defects was detected. It was determined that grain boundary diffusion was > 3 orders of magnitude faster than volume diffusion. However, it seems that grain boundary diffusion is influenced by the point defects in a similar way as the volume diffusion. 4 figs.
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