Influence of One Monolayer Thickness Variation in GaAs/AlGaAs Five-Layer Asymmetric Coupled Quantum Well upon Electrorefractive Index Change

Abstract

The five-layer asymmetric coupled quantum well (FACQW) is a new potential-tailored quantum well (QW) for ultrafast and low-voltage optical modulators and switches. First, the influence of one monolayer (ML) thickness variation of a single layer in the GaAs/AlGaAs FACQW on the electrorefractive index change Δn is theoretically studied. The thickness variation of two thicker GaAs layers has a considerable influence on Δn of the FACQW, while the thickness variation of thin AlAs and AlGaAs barrier layers has a smaller influence on Δn. The ratio of the thicknesses of the two GaAs well layers significantly affects the Δn characteristics of the FACQW. The change Δn does not vary appreciably as long as the ratio is kept constant. Second, the influence of the statistical fluctuation of the layer thickness by 1 ML in all of the layers on the Δn characteristics of the FACQW is also discussed. Even when Δn decreases with the increase of the occurrence probability of a layer being thicker or thinner by 1 ML, the FACQW still has a much larger Δn than conventional rectangular quantum wells do.