Abstract
The single layer In0.5Ga0.5As quantum dots (QDs) were grown on a thin InxGa1-xAs underlying layer by metal-organic chemical vapor deposition(MOCVD) via Stranski-Krastanow growth mode. The effect of different indium composition in the InxGa1-xAs underlying layer was investigated usingatomic force microscopy (AFM). AFM images show that the QDs structures were formed on the surface. The dots formation on the surface changes withdifferent composition of InxGa1-xAs underlying layer. Increasing indium composition in the underlying layer resulted to formation of higher density andsmaller size dots. Several large dots were also formed on the surface. Growing of underlying layer reduces the lattice mismatch between In0.5Ga0.5As andGaAs, and decreases the critical thickness of the dots. This strongly influences the dots nucleation on the surface. Growth of quantum dots usingunderlying layer is one way to modify dot formation in order to achieve uniform QDs of right size and high density, which are essential for QDs deviceapplications.
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