Abstract
The surface segregation of indium (In) atoms was investigated during the growth of InGaAs layers by reflection high-energy electron diffraction (RHEED). We showed that the strong damping of the RHEED oscillations usually observed during the deposition of InGaAs on GaAs was directly related to the presence of a population of In atoms at the surface of the sample originating from the segregation phenomenon in the InGaAs layers. We proposed a simple model to estimate the segregation coefficient R in situ and in real time from the RHEED oscillations. Our results were quantitatively confirmed by several RHEED measurements carried out under very different growth conditions and were in excellent agreement with data from the literature.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
