Abstract
Nickel thin films were grown on quartz substrates in ultra‐high vacuum at laser fluence of 98 J/cm2 using pulsed laser deposition. Effects of substrate temperature on the electromagnetic properties of the films were investigated. XRD data reveal crystalline growth at substrate temperature (Ts) of 500°C. Roughness of the thin films at Ts of 100°C was noted as 8 nm which was decreased to 3 nm at 500°C. Coercive field and electrical resistivity were decreased from 10 to 5 mT and 0.71 to 0.064 μΩ‐m, respectively, at higher substrate temperature. Magnetoresistance for both modes of configuration and Hall mobility were decreased, while carrier density and Hall coefficient showed opposite behavior with increased substrate temperature.
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