Abstract
The influence of growth interruption on the surface and luminescence properties of AlGaN/GaN ultraviolet multi-quantum wells (UV MQWs) is investigated. It is found that when the well and barrier layers of MQW samples are continuously grown at the same temperature, they have lower edge dislocation density and flatter surface of MQWs compared to samples with interrupted well and barrier growth. Moreover, continuous growth of well and barrier layers is more conducive to improving the luminescence efficiency of MQWs. This phenomenon is attributed to more impurity incorporation induced by the growth interruption, while a continuous growth of well and barrier can reduce surface diffusion and migration processes of atoms, reducing the defects and surface roughness of MQWs. In addition, the continuous growth of well and barrier can better control the reaction between Al and N atoms, avoiding the formation of excessively high Al content AlGaN at the well/barrier interface, thus improving the luminescence of UV MQWs.
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