Abstract
Electrical resistance of the vacuum-deposited condensate has non-linear relation to the condensate film thickness. Therefore, there exists a need for experiments to study applicability of the non-invasive method for condensate resistance measurement and to identify parameters by measuring condensate resistance directly. By using two-point measurement probes, this study analyses the influence of electrons emitted in the process of evaporator electronic emission on the method for direct measurement of condensate resistance. DOI: http://dx.doi.org/10.5755/j01.eee.20.2.6379
Highlights
Mathematical models [1], [2] of non-invasive methods for measurement of vacuum-deposited condensates describe quite precisely the measurement method itself
There exists a need for experiments to study applicability of the non-invasive method for condensate resistance measurement and to identify parameters by measuring condensate resistance directly
The results presented show (Fig. 4) that additional thermoelectronic emission source contributes to higher values of the voltage uB
Summary
Mathematical models [1], [2] of non-invasive methods for measurement of vacuum-deposited condensates describe quite precisely the measurement method itself This measurement method utilises a flow of electrons emitted from the hot evaporator. There exists a need for experiments to study applicability of the non-invasive method for condensate resistance measurement and to identify parameters by measuring condensate resistance directly. This can be implemented using conventional twoor four-point [5] measurement probes, on which metal condensation takes place. By using two-point measurement probes, this study analyses the influence of electrons emitted in the process of evaporator electronic emission on the method for direct measurement of condensate resistance
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