Abstract
Anti-Reflective (AR) thin film coatings of SiO₂ (n=1.48) and TiO₂ (n=2.17) were deposited by ion-beam assisted deposition (IBAD) with End-Hall ion source and conventional electron beam (e-beam) evaporation to investigate the effect of deposition method on the refractive indicies (n) of the films. Green-light generation using a GaAs laser diode was achieved via excitation of the second harmonic. The latter resulted from the transmission of the fundamental guided-mode wave of 1064 nm through periodically poled LiNbO₃. Large differences in the refractive indicies of each of the layers in the multilayer coating may improve AR performance. IBAD of SiO₂ reduced its refractive index from 1.45 to 1.34 at 1064 nm. Conversely, e-beam evaporation of TiO₂ increased its refractive index from 1.80 to 2.11. In addition, no fluctuations in absorption at the wavelength of 1064 nm were found. The results suggest that films prepared by different deposition methods can increase the effectiveness of multilayer AR coatings.
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