Abstract
We show that the chemical composition and the amount of residual monomers in polymethylmethacrylate significantly affect the evolution of optical waveguide formation induced by UV surface irradiation. We employ an interferometric approach in Mach-Zehnder configuration to determine the refractive index depth profile in different planar polymethylmethacrylate materials. Our results reveal a distinctive different surface and buried waveguide formation for materials having different monomer content. In particular, we find that for smaller residual monomer content buried waveguide formation is less pronounced, which is in turn preferential for a selective light guidance in planar polymer structures. Attenuation measurements confirm a difference in attenuation coefficient of 0.5dB/cm.
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