Abstract
The FeCo/AlOx/Co magnetic tunnel junction was fabricated using a two-step plasma oxidation technique. The tunnelling magneto-resistance ratio of the junction as-deposited was about 8.5%, and reached 14.0% after annealing at 200°C. Transmission electron microscopy, high-resolution electron microscopy and electron holography were used to study the microstructure of the junction. The enhancement of the magneto-resistance effect after annealing could be attributed to the uniformity of the barrier layer, the improvement of FM/I interfaces, and the deoxidization of the bottom ferromagnetic electrode.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
