Abstract
The influence of additional Al on the sputtering of W + Al, Mo + Al and Cu + Al films by Xe + ions is investigated. The relative sputtering coefficients of alloys are less than the sputtering coefficient of pure films. The main reason is supposed to be the break of the displacement chain when a light species is included in the chain. The percentage of Al-containing chains and therefore the Al influence on sputtering is small at low ion energy. At a high Al concentration sputtering increases due to the appearance of chains consisting of only the additional atom species.
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