Abstract
In order to increase the efficiency of silicon based Thin Film Solar (TFS) cells, it is necessary to use better light management techniques. Texturization of sputtered aluminium doped zinc oxide (Al:ZnO or AZO) films has opened up a variety of ways for optimization of light trapping schemes. Here, AZO has been etched with acid as well as alkali. A difference in optical and electrical characteristics of acid and alkali etched AZO has been observed. By etching AZO with potassium hydroxide (KOH), 82% transmittance (in the visible range), high rms roughness and ∼13Ω/□ sheet resistance have been achieved.
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