Abstract
The utility of precursors for atomic layer chemical vapour deposition (ALCVD) growth is limited by the sublimation and decomposition temperatures. Sublimation temperatures are conveniently obtained by thermogravimetry (TG) under vacuum. We present here a relatively inexpensive method to obtain information about the decomposition temperature for a precursor candidate for ALCVD. This approach requires an oven with a controlled temperature gradient and a long ampoule for each precursor. The precursors tested in this work comprise the thd complexes (Hthd=2,2,6,6-tetramethylheptane-3,5-dione) of V, Cr, Mn, Fe, Co, Ni, Cu, Zn, La, and Ca.
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