Industrial Applications and Future Directions

Abstract

In recent years the industrial community has become increasingly aware that in order to understand complex materials they require both high resolution imaging (<.2nm) and high spatial resolution microanalysis (≤2.0nm). In working with the members of the Industrial Associates Program at Arizona State University, we have come to recognize and acknowledge these needs and to accept that such needs are on the increase. Each new project has involved complex and difficult analyses, pushing the limits of available technology. The following outlined examples highlight some of the work currently in progress.Zeolites (molecular sieve materials): Of primary importance in utilizing these materials is structural determination of many of the new compounds that are being synthesized. In order to ascertain the complete structure, high-resolution images approaching .2nm are necessary. Considering the severe beam sensitivity of these materials, it is extremely difficult to acquire images that are close to optimum defocus, without drift and damage. Recently, however, with on-line image acquisition systems becoming available, an image can be captured in 1/30th of a second with very low beam doses and effectively no drift present. Contrast enhancement and band filtering (a ring filter cutting off low and high frequencies; the ring is the same in all directions) make it possible to greatly improve the image detail and thus improve the prospects of developing a crystal structure model, (see Fig. 1a,b).