Abstract
Ion technologies for the improvement of surface properties of material are under change due to economic requirements. The beam implanter technology developed for processing of flat semiconductor wafers is too expensive for high dose surface modification of three-dimensional steel components. We present results obtained with a bandshaped RF ion source operated together with large area magnetron sputter sources. Low dose Ar + ion beam mixing is performed to promote the adhesion of hard TiN protective coatings deposited at a temperature of 200°C onto ball bearing steel. By using a rotating substrate holder film deposition and ion implantation are alternated and the surfaces of many parts can be modified within the same charge in a cost effective way. Alternative approaches are also discussed.
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