A perspective of eV-MeV ion beams

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“Ion engineering” — ion assisted techniques — such as ion beam deposition, epitaxial growth, etching, implantation, surface treatment, and ion beam mixing, is discussed. The kinetic energy and the charge of ions could influence the physical and chemical properties of materials. For example, in deposition, a kinetic energy from several eV to a few hundreds eV is effective and useful. At higher kinetic energies, ion implantation as well as ion beam mixing could be applied to modify the surface properties. The process techniques using eV to MeV ion beams require the development of ion sources with high current, brightness, and charge state which could transfer ion beams with a large diameter, fine focus, and extremely low and high energy. Furthermore, the combination of different processes such as deposition, sputtering and ion implantation was found to be useful for industrial applications of ion beams. New materials and high performance devices could be prepared by these process techniques.