Abstract
Transparent conducting tin-doped indium oxide (ITO) thin films were deposited on Teflon and glass substrates using RF magnetron sputtering technique from an ITO ceramic target. The substrates were loaded on a cylindrical drum maintained at a temperature of 15 ± 2°C and rotated at a constant rate of 6 rpm. At the optimal deposition condition, the ITO thin films with maximum transmission of 93% and a minimum sheet resistance of 10Ω/∠ was achieved.
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