Abstract
Abstract This paper shows how the defocus latitude of a deep UV (DUV) system depends on the thickness of the photoresist in two ways: by thin film interference, and by the bulk thickness. Results of experiments and simulations are presented. Since both resolution and defocus latitude are expected to depend on the bandwidth of the laser, we here report the first tests to evaluate the merits of laser bandwidth narrowing down to FWHM = 1.2 pm on the imaging capabilities of a 0.5 Numerical Aperture (NA) DUV stepper. Especially for 0.25 μm lithography, this is found to be advantageous.
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