Abstract
Simple chemical vapor deposition (CVD) of M(CO), (M = Cr, Mo, W) onto phenylene- and biphenylene-bridged organosilica mesoporous materials (HMM-ph, HMM-biph) led to the efficient formation of C6H4M(CO)3 and (C6H4)2M(CO)3 complexes, respectively, which are directly fixed and incorporated within the framework structure of HMM-ph and HMM-biph having molecular-scale periodicity in the pore walls. FT-IR investigations revealed that thus formed C6H4M(CO), or (C6H4)2M(CO)3 complexes are thermally stable even under thermovacuum treatment at 473 K.
Published Version
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