Abstract

Alpine plants like Soldanella alpina L. are subjected to high PAR and high UV radiation. Among the important photoprotective mechanisms that prevent photoinhibition under such conditions, passive optical barriers such as UV-absorbing compounds were investigated. In this study, temporal and spatial patterns of epidermal UV-A absorbance for S. alpina leaves were investigated with a combination of absorbance measurements at 375nm and imaging methods. UV-A absorbance was highest in plants acclimated to full sunlight and was markedly stable during the leaves' lifetime. UV-A absorbance was correlated with leaf structure (leaf mass per area ratio, density of epidermal cells and stomata) and biochemical features such as chlorophyll and carotenoid content and ratio, which are characteristics of light acclimation. UV-A-absorbing compounds were mainly localised in the epidermal vacuoles and trichomes. Leaves with low UV-A absorbance were significantly more photosensitive than leaves with high UV-A absorbance. However, the epidermal UV-A absorbance increased in low-absorbance leaves under full sunlight even in the absence of UV radiation. Results suggest that high epidermal UV-A absorbance protects S. alpina leaves from photoinactivation, which is especially important after snowmelt, when plants are suddenly exposed to full sunlight.

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