Abstract

We propose a disruptive method to accelerate the crystallization at low temperatures of functional metal oxide films whereby hydroxyl radicals (•OH) are photogeneratedin situfrom the atmosphere where solution-deposited layers are UV-irradiated.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.