In-situ optimization of lateral film uniformity in PVD system by using Fiber Bragg grating temperature sensors

Abstract

Fiber Bragg grating (FBG) based temperature sensing method has been employed in this work for measuring the lateral temperature distribution on substrate plane during pulse DC magnetron sputtering deposition for optimization of lateral film uniformity. The evolution of temperature distribution with the variation of important process parameters like pulse width (496–1616 ns), deposition pressure (3.1 × 10−3–1.9 × 10–2 mbar) and sputtering power (25–250 W) have been measured over 40 mm radial distance on glass substrate horizon. To investigate the effect of substrate height on the temperature distribution, the later has been measured at two different substrate heights (60 mm and 90 mm) for varying sputtering power. Finally, the effect of variation in temperature distribution on uniformity of thickness and optical, morphological and structural properties have been investigated by separately depositing two HfO2 thin films at two representative extreme deposition powers (75 W and 200 W). The correlation of film non-uniformity of the above properties with the temperature distribution suggests that FBG based multipoint temperature sensing can be possibly used as an indicative tool for in situ optimization of the lateral film uniformity. In addition, the fast response and workability in plasma environment of FBG sensors enables precise in situ mapping of temperature distribution in sputtering process.