Abstract
The application of spectroscopic reflectometry to the monitoring of epitaxial lateral overgrowth of GaN in low pressure metalorganic vapor phase epitaxy has been investigated. Real-time vertical and lateral growth rates and hence thickness and wing width of the growing GaN are extracted. A vertical growth enhancement was clearly observed at an early stage, followed by vertical growth suppression until full coalescence was achieved. The lateral to vertical growth ratio was obtained showing clear time dependent characteristics. The observations were explained by considering the mass transport between the growing (0001) facets and the {112¯0} sidewall facets.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
