Abstract
Ultraviolet (UV) absorption spectroscopy has been used as an in-situ diagnostic on a MOCVD reactor to measure absolute equilibrium metalorganic and hydride partial pressures and the transient reactant switching response. Several reactor and optical geometries were used to characterize the effects of flow velocity, pressure, reactant gas, system geometry and susceptor temperature. Absorption spectra for trimethylantimony (TMSb), trimethylindium (TMIn), trimethylaluminum (TMAl), trimethylgallium (TMGa), diethylzinc (DEZn), and arsine (AsH 3) are presented. The use of UV absorption spectroscopy as a method of continuously monitoring the reactant partial pressures during MOCVD of III-V materials is discussed.
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