Abstract
A nanoscale NiFe permalloy point-contact was fabricated in planar configuration on a MgO substrate using an etching process with a horizontal incidence ion beam. In-situ anisotropic magnetoresistance (MR) measurements were successively performed in a vacuum to prevent oxidation. After around 800 seconds of milling, the MR ratio steeply increased to about 2.3% which was much larger than the anisotropic MR ratio of the MR film. In addition, the test-element showed low (high) resistance with parallel (anti-parallel) magnetic geometry of the pinned and free area.
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