Abstract

The growth of oriented crystalline PZT films on (111) Si substrates at different substrate temperatures is reported. By varying the laser fluence and other deposition parameters we have been able to produce, in a single-step process, highly oriented PZT films with good piezoelectric properties at much lower temperatures than reported in other PLD experiments. X-ray measurements and secondary ion mass spectroscopy, as well as piezoelectric measurements, are used to characterize the different samples. Experimental evidence is presented that at high laser fluence (25 J/cm 2) better properties for PLD films are obtained with lower substrate temperatures.

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