Abstract

The effect of annealing at temperatures between 200 – 400 °C on the microstructural evolution and tensile properties of a recently developed macro defect free electroformed nanocrystalline Ni-32at%Co free-standing sheet metal was investigated. The tensile strength of the materials exhibited an extrinsic Hall-Petch (HP) to inverse Hall-Petch (IHP) transition due to grain growth. In situ transmission electron microscopy (TEM) annealing revealed for the first time that at lower annealing temperatures, in addition to reordering of atoms at grain boundaries, grain rotation and grain recovery were also found to be mechanisms for grain boundary relaxation (GBR). Combined, these mechanisms contribute to the increase in ultimate tensile strength (UTS) observed in the IHP regime of the Ni-32at%Co alloy. TEM energy dispersive X-ray spectroscopy (EDX) and in situ synchrotron X-ray diffraction (XRD) annealing analyses showed that the drop in UTS and ductility in the HP regime after annealing at higher temperatures was associated with the onset of abnormal grain growth and sulfur impurity segregation to random high angle boundaries. Atom probe tomography (APT) further showed that there is no sulfur impurity segregation in the electroformed material before annealing. Increasing in annealing temperature led therefore to a transition from ductile to brittle fracture manifested as a change in dimple to mixed and eventually to faceted brittle fracture surfaces at 400 °C.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.