In-line system for dc reactive sputtering deposition of insulating layers with unswitched current controllers

Abstract

Our Low Energy Cold Cathode Ion Source (LE-UCCIS) has been installed in an in-line coating system which permits ionic cleaning, etching processes, ion beam-assisted deposition (IBAD), and reactive deposition of insulators by use of a traditional dc electrical controller. The incorporation of ionic cleaning and ion beam-assisted deposition into a single unit provides the advantage of improved adhesion through interface mixing in a much more compact and lower-priced unit. The problem of arcing in dc reactive deposition of thin films has been overcome by changing the geometry of the sputtering source, so as to generate considerably more even target erosion. This has rendered the use of pulsed dc current controllers unnecessary, thereby also reducing costs. In the present paper we describe the characteristics of the system using this sputtering source, giving particular attention to the design features that make it arc-free.