Abstract
Through the theoretical study of electron spin lifetime in the 2DEG of doped Si, we highlight a dominant spin relaxation mechanism induced by the impurity central-cell potential near an interface via intervalley electron scattering. At low temperatures and with modest doping, this Yafet spin flip mechanism can become much more important than the Dyakonov-Perel spin relaxation indcued by the structural Rashba spin-orbit coupling field. As the leading-order impurity-induced spin flip happens only between two non-opposite valleys in Si, two-dimensional electron gas (2DEG) systems in Si MOSFETs or SiGe heterostructures are a natural platform to test and utilize this spin relaxation mechanism due to the valley splitting near the interface and its tunability by electrical gating or applied stress. Our proposed new spin relaxation mechanism may explain a part of the spin relaxation contribution to Si-based 2DEG systems.
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