Improving high temperature tribological performances of Si doped diamond-like carbon by using W interlayer

Abstract

Diamond-like carbon films (DLC) with different silicon contents combined with W interlayer are deposited by plasma-assisted reactive magnetron sputtering. The structures and high-temperature tribological properties of the films are investigated. The results reveal that the pure DLC film is worn out at 400 °C because of graphitization, while the Si-DLC film with Si content of 4.56 at.% keeps low friction coefficient (0.2–0.05) at high temperature up to 500 °C. The 14.56 at.% Si-DLC film failed at 500 °C induced by the formation of SiO2. The improved high-temperature tribological performance of the 4.56 at.% Si-DLC film is attributed to the tribochemistry of W interlayer at 500 °C which formed a film composed of tungsten oxides and carbide.