Abstract
An analysis method is developed to investigate the vibrational properties of thin films by use of infrared in situ ellipsometry. The procedure is based on the study of regions located in or outside the vibrational bands as a function of film thickness. Infrared index, line positions, bandwidths, and absorption intensities can be determined, even in the case of low oscillator strengths. As an illustration, C—H bonding of 100-nm-thick hydrogenated amorphous carbon films have been studied: Weak vibrations located at 1405 and 1440 cm-1, which had not been observed so far, are evidenced, thus revealing the presence of CH olefinic units and methyl groups bonded to sp2-configured carbon.
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