Abstract

An important challenge in industrial laser ablation is laser-induced damage. In this study, reduced damage was achieved through the transition of the laser distribution from a Gaussian beam to a top-hat beam using diffractive optical elements (DOE), which overcome inhomogeneous irradiation. The higher peak fluence of a Gaussian beam far exceeded the ablation threshold and led to severely melted silicon at a higher depth covering the polished texture. The top-hat beam, with uniform irradiation, had a superior ablation characteristic and created a uniform square opening with the shallow melted silicon in the lift-off process. Thus, its effective minor carrier lifetime was 15.35% less at an ablated area fraction of 2% after re-passivation because of the decreased damage. After optimizing the ablation pattern with a top-hat beam, the local contacts improved the average open-circuit voltage (Voc) and short-circuit current (Isc) values of the cells due to the decreased damage and the uniform openings, but the damage induced by a Gaussian beam was too deep and can be partly restored under back surface field (BSF) formation. The overall increment in Isc and Voc enhanced the average efficiency by 0.05% of the absolute value for the PERC cells and 0.03% of the absolute value for bi-facial PERC cells.

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