Abstract
Titanium oxide film was coated on the surface of low temperature isotropic carbon (LTI-carbon) by ion beam enhanced deposition (IBED) to improve the blood compatibility of the LTI-carbon mechanical heart valve. The prepared film was found to be polycrystalline with Ti 2+, Ti 3+ and Ti 4+ coexisting. This oxygen-lack n-type semiconductor film exhibits a better hemocompatibility than that of LTI-carbon in both in vitro and in vivo investigations. The reason is attributed to the surface energy and work function, which are two influencing factors on blood compatibility.
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