Abstract
Silver (Ag)/fluorine-doped tin oxide (FTO) bilayer films were prepared by sputtering Ag layers on commercial FTO glass. The effects of traditional furnace annealing, nanosecond pulsed laser annealing and furnace/laser dual annealing on the structure and photoelectric properties of the Ag/FTO films were investigated. It is found that all the annealing methods increased the grain size of the films, leading to enhancement of the transmittance and conductivity. Traditional furnace annealing at 400°C for 20min brought about the formation of smaller Ag nanograins, while subsequent 532nm nanosecond pulsed laser annealing with a fluence of 0.9J/cm2 melted the Ag nanograins to conglomerate with larger SnO2 grains, resulting in the highest figure of merit of 1.7×10−2Ω−1. The results indicate that furnace/laser dual annealing is a more effective method for improving overall photoelectric properties of FTO-based films.
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