Abstract
For the realization of high-performance organic static induction transistors (OSITs), it is important to investigate the effect of a hole injection barrier at the interface between a pentacene films and a source electrode in OSITs. In this study, the OSITs based on pentacene films were fabricated on various metallic source electrodes with different work functions and on copper phthalocyanine (CuPc)/indium tin oxide (ITO) electrodes with different CuPc thicknesses. The hole injection barrier was affected by the work function of metallic source electrodes (ITO, Au, and Pt) and the thickness of CuPc (0, 3, and 5 nm). The obtained results demonstrate that a high on/off ratio is achieved when a hole injection barrier with a moderate height is formed at the interface. It was found that controlling the hole injection barrier is effective for improving the characteristics of OSITs.
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