Abstract
Dielectric/metal/dielectric-structured transparent conductive films are prone to structural and functional failures under thermal oxidation environment. Herein, a Ni layer was employed to improve the photoelectric stability of AZO/Ag/AZO multilayer films. The AZO/Ni/Ag/AZO film exhibited a transmittance of 75%, surface resistance of ~7 Ω/sq, and stable structure after thermal oxidation treatment at 500 °C. The visible light transmittance, surface resistance, and figure of merit values of the AZO/Ag/AZO and AZO/Ni/Ag/AZO films were determined after high-temperature treatment in ambient air. The diffusion of Ag was effectively inhibited by the Ni layer, and the photoelectric stability of AZO/Ag/AZO films was improved under thermal environment.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
