Abstract
SummaryA novel technology for banana starch modification has been developed using dielectric barrier discharge (DBD) plasma, and the effect of DBD plasma treatment on the solubility and pasting behaviours of banana starch were evaluated. The solubility of treated starch significantly increased from 1.35 to 15.05 g 100 g−1 at 55 °C as the treatment intensity increased. Rapid viscosity analyser examination showed a dramatic change in the pasting behaviours of modified starch, and the peak viscosity decreased from 5242.0 to 153.0 (cP) as the treatment intensity increased. Evidence of nonpenetrative damage caused by plasma etching was shown by scanning electron microscope micrographs. The results of X‐ray diffraction and Fourier‐transform infrared spectroscopy analyses indicated that the DBD treatment changed the granular structure of banana starch.
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