Improved RF integrated magnetic thin-film inductors by means of micro slits and surface planarization techniques

M Yamaguchi,Y Shimada,K Suezawa,T Moizumi,S Tanabe,M Baba,A Haga,K.I Arai,K Itoh

doi:10.1109/20.908872

Improved RF integrated magnetic thin-film inductors by means of micro slits and surface planarization techniques

M Yamaguchi, Y Shimada + Show 7 more

https://doi.org/10.1109/20.908872

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Journal: IEEE transactions on magnetics	Publication Date: Jan 1, 2000
Citations: 45

Affiliation: Tohoku University, Tohoku Gakuin University, Mitsubishi Electric (Japan)

#Magnetic Thin-film Inductors #Monolithic Microwave Integrated Circuits + Show 8 more

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Abstract

Improvement of magnetic thin-film inductors for RF monolithic microwave integrated circuits (MMICs) is discussed. Surface planarization reduced the surface roughness down to R/sub a/=1.2 nm, which enhanced the quality factor by 14% over a nonplanarized inductor. The orthogonal bar slit pattern was the best among the fabricated slit patterns, L=7.55 nH (+12% of the air core), R=6.80 /spl Omega/ and Q=7.09 (+9%) were obtained for the orthogonal bar slit pattern (slit width=0.75 /spl mu/m) with surface planarization.

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