Abstract
We prepared V-doped Bi6Fe2Ti3O18 thin films on Pt/Ti/SiO2/Si (100) substrates by using a chemical solution deposition route and investigated the doping effect on the microstructure, dielectric, leakage, and ferroelectric properties of Bi6Fe2Ti3O18 thin films. The Bi5.97Fe2Ti2.91V0.09O18 thin film exhibits improved dielectric properties, leakage current, and ferroelectric properties. The incorporation of vanadium resulted in a substantially enhanced remnant polarization (2Pr) over 30 μC/cm2 in Bi5.97Fe2Ti2.91V0.09O18 thin film compared with 10 μC/cm2 in Bi6Fe2Ti3O18 thin film. It is demonstrated that the improved properties may stem from the improvement of crystallinity of the films with the contribution of suppressed oxygen vacancies and decreased mobility of oxygen vacancies caused by the V-doping. The results will provide a guidance to optimize the ferroelectric properties in Bi6Fe2Ti3O18 thin films by chemical solution deposition, which is important to further explore single-phase multiferroics in the n = 5 Aurivillius thin films.
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