Abstract

An ultra-thin AlGaN last quantum barrier (LQB) with a high Al content is effective in enhancing the hole injection in AlGaN-based deep UV LEDs (DUV-LEDs). However, it is very challenging to realize the ultra-thin LQB by the metalorganic chemical vapor deposition technique. In this work, a well-defined 1.0 nm thick AlGaN LQB with unintentionally high Al content was achieved by controlling the surface desorption kinetics for the growth of multiple quantum wells. The light output power of the DUV-LEDs with 1 nm thick LQB was increased by 44% to 7.16 mW at 40 mA, and the peak external quantum efficiency reached 4.04%.

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