Abstract
A single quadrupole atmospheric pressure ionization mass spectrometer (APIMS) has been used to develop new techniques for quantitative analysis of impurities in ultrahigh purity nitrogen and argon used in the manufacture of high density integrated circuits. These new techniques allow use of such an instrument for applications which have not been previously documented. The simultaneous analysis of nitrogen and carbon monoxide impurities in ultrapure argon is accomplished by taking advantage of APIMS spectral differences at m/e values other than 28. Argon impurity levels in nitrogen have also been analyzed by APIMS despite the fact that argon has a higher ionization potential than nitrogen. A quantitative analysis technique for carbon monoxide impurity in nitrogen has also been developed for APIMS which relies on simple data analysis techniques.
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